12 August 1986 Performance of Oblique Angle of Incidence Collection Systems in the VUV
Author Affiliations +
High rejection filters are difficult enough to achieve in the UV-VIS-IR with known materials and constants. Even more difficult is the design and manufacture of rejection filters in the EUV and VUV given the uncertainty of optical constants and their wide variation over this spectral range. We have begun work to characterize materials from 584 Å to 1,300 Å to verify reported optical constants, in order to design and realize the optimum collection system.
© (1986) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Geza L. Keller, Marion L. Scott, Kenneth Mitchell, "Performance of Oblique Angle of Incidence Collection Systems in the VUV", Proc. SPIE 0689, X-Ray Calibration: Techniques, Sources, and Detectors, (12 August 1986); doi: 10.1117/12.936586; https://doi.org/10.1117/12.936586


High-performance multilayer coatings for 106 nm
Proceedings of SPIE (September 28 2007)
Formation of contaminant droplets on surfaces
Proceedings of SPIE (September 07 2006)
Metal Reflectors in the EUV
Proceedings of SPIE (August 12 1986)
Reflection Suppression Coatings For 900 1200...
Proceedings of SPIE (July 28 1989)

Back to Top