12 February 2008 Polysilane-based 3D waveguides for optical interconnects
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Abstract
We have been developing the optical waveguide for the multimode using the photo-bleaching property of polysilane. The refractive index of polysilane can be easily changed by exposing to UV light as photobleaching. Using this property, we can make waveguide with simple processes as spin coating, exposing and annealing. We found that this waveguide has thermal adhesive property with glass substrate. And we applied this feature to fabricate multilayered optical waveguides that have three-dimensional structure and can change the optical light at right angle.
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Kouhei Ogura, Takeshi Oka, Emi Watanabe, Kazunori Aoi, Hiroshi Tsushima, Hiroaki Okano, Shuji Suzuki, Seiki Hiramatsu, "Polysilane-based 3D waveguides for optical interconnects", Proc. SPIE 6891, Organic Photonic Materials and Devices X, 68910Q (12 February 2008); doi: 10.1117/12.762655; https://doi.org/10.1117/12.762655
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