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20 March 2008 Breaking the limits: combination of electron beam lithography and nanoimprint lithography for production of next-generation magnetic media and optical media
Babak Heidari, Marc Beck
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Proceedings Volume 6921, Emerging Lithographic Technologies XII; 692103 (2008) https://doi.org/10.1117/12.782461
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States
Abstract
The increased requirement e.g. resolution in multimedia displays creates the need for more storage capacity in both optical discs as well as hard drives. Blu-Ray-ROM and particularly future optical media formats require the employment of new lithography technologies. Today's magnetic media technology is facing difficulties to continue to higher surface densities and larger capacities due to the superparamagnetic limit. By using isolated magnetic domains to store the data, making it possible to get beyond 500 Gbits/in2 densities. The approach we describe uses a unique direct-write electron beam lithography system for lithography on a rotating substrate and creates a patterned master disc, which can be used as a mold in replication of final disks by imprint lithography. The imprint process replicates the original pattern with an exceptionally fast turn around time, making mass production of optical and magnetic media possible. However, realization of these new technologies offers challenges in implementation.
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Babak Heidari and Marc Beck "Breaking the limits: combination of electron beam lithography and nanoimprint lithography for production of next-generation magnetic media and optical media", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692103 (20 March 2008); https://doi.org/10.1117/12.782461
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KEYWORDS
Magnetism
Electron beam lithography
Lithography
Nanoimprint lithography
Optical discs
Polymers
Electron beams
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