26 March 2008 High resolution nanoimprint templates for dual damascene: fabrication and imprint results
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A dual damascene template fabrication process has been developed, which enables the structuring of high-resolution, high-aspect pillars on top of lines. Based on this technology templates with three different designs have been fabricated and characterized. Two templates are dedicated for an assessment of the fabrication process using a regular test design on one hand and an arbitrary CMOS design on the other hand. With the third template via chains shall be later realized as demonstrator for electrical tests. The templates have been imprinted in resist and sacrificial material on an Imprio 55 and an Imprio 100 tool. The usability of each fabricated template could be confirmed for the specific application. For the template manufacturing a Vistec variable shape e-beam (VSB) writer SB352HR and appropriate positive-tone and negative-tone chemically amplified resists (CAR) have been used.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mathias Irmscher, Mathias Irmscher, Joerg Butschke, Joerg Butschke, Ron Carpio, Ron Carpio, Brook Chao, Brook Chao, Wei-Lun Jen, Wei-Lun Jen, Corinna Koepernik, Corinna Koepernik, Lorenz Nedelmann, Lorenz Nedelmann, Jordan Owens, Jordan Owens, Frank Palmieri, Frank Palmieri, Marcus Pritschow, Marcus Pritschow, Christian Reuter, Christian Reuter, Holger Sailer, Holger Sailer, Ken Satoodeh, Ken Satoodeh, Jeff Wetzel, Jeff Wetzel, Bruce Wilks, Bruce Wilks, Grant Willson, Grant Willson, } "High resolution nanoimprint templates for dual damascene: fabrication and imprint results", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69210D (26 March 2008); doi: 10.1117/12.772295; https://doi.org/10.1117/12.772295

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