20 March 2008 CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography
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Abstract
We are developing a laser produced plasma light source for high volume manufacturing (HVM) EUV lithography. The light source is based on a high power, high repetition rate CO2 laser system, a tin target and a magnetic ion guiding for tin treatment. The laser system is a master oscillator power amplifier (MOPA) configuration. We have achieved an average laser output power of 10 kW at 100 kHz by a single laser beam with good beam quality. EUV in-band power equivalent to 60 W at intermediate focus was produced by irradiating a tin rotating plate with 6 kW laser power. This light source is scalable to more than 200 W EUV in-band power based on a 20-kW CO2 laser. Collector mirror life can be extended by using droplet target and magnetic ion guiding. Effectiveness of the magnetic ion guiding is examined by monitoring the motion of fast Sn ion in a large vacuum chamber with a maximum magnetic flux density of 2 T.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Akira Endo, Akira Endo, Hideo Hoshino, Hideo Hoshino, Takashi Suganuma, Takashi Suganuma, Krzysztof Nowak, Krzysztof Nowak, Tatsuya Yanagida, Tatsuya Yanagida, Takayuki Yabu, Takayuki Yabu, Takeshi Asayama, Takeshi Asayama, Yoshifumi Ueno, Yoshifumi Ueno, Masato Moriya, Masato Moriya, Masaki Nakano, Masaki Nakano, Hiroshi Someya, Hiroshi Someya, Toshihiro Nishisaka, Toshihiro Nishisaka, Tamotsu Abe, Tamotsu Abe, Georg Soumagne, Georg Soumagne, Hiroshi Komori, Hiroshi Komori, Hakaru Mizoguchi, Hakaru Mizoguchi, Akira Sumitani, Akira Sumitani, Koichi Toyoda, Koichi Toyoda, } "CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69210T (20 March 2008); doi: 10.1117/12.771959; https://doi.org/10.1117/12.771959
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