MAGIC: a European program to push the insertion of maskless lithography

L. Pain; B. Icard; S. Tedesco; B. Kampherbeek; G. Gross; C. Klein; H. Loeschner; E. Platzgummer; R. Morgan; S. Manakli; J. Kretz; C. Holhe; K.-H. Choi; F. Thrum; E. Kassel; W. Pilz; K. Keil; J. Butschke; M. Irmscher; F. Letzkus; P. Hudek; A. Paraskevopoulos; P. Ramm; J. Weber

doi:10.1117/12.772472

28 March 2008 MAGIC: a European program to push the insertion of maskless lithography

L. Pain; B. Icard; S. Tedesco; B. Kampherbeek; G. Gross; C. Klein; H. Loeschner; E. Platzgummer; R. Morgan; S. Manakli; J. Kretz; C. Holhe; K.-H. Choi; F. Thrum; E. Kassel; W. Pilz; K. Keil; J. Butschke; M. Irmscher; F. Letzkus; P. Hudek; A. Paraskevopoulos; P. Ramm; J. Weber;

Author Affiliations +

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 69211S (2008) https://doi.org/10.1117/12.772472
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

With the willingness of the semiconductor industry to push manufacturing costs down, the mask less lithography solution represents a promising option to deal with the cost and complexity concerns about the optical lithography solution. Though a real interest, the development of multi beam tools still remains in laboratory environment. In the frame of the seventh European Framework Program (FP7), a new project, MAGIC, started January 1st 2008 with the objective to strengthen the development of the mask less technology. The aim of the program is to develop multi beam systems from MAPPER and IMS nanofabrication technologies and the associated infrastructure for the future tool usage. This paper draws the present status of multi beam lithography and details the content and the objectives of the MAGIC project.

Citation Download Citation

L. Pain, B. Icard, S. Tedesco, B. Kampherbeek, G. Gross, C. Klein, H. Loeschner, E. Platzgummer, R. Morgan, S. Manakli, J. Kretz, C. Holhe, K.-H. Choi, F. Thrum, E. Kassel, W. Pilz, K. Keil, J. Butschke, M. Irmscher, F. Letzkus, P. Hudek, A. Paraskevopoulos, P. Ramm, J. Weber, "MAGIC: a European program to push the insertion of maskless lithography", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69211S (28 March 2008); doi: 10.1117/12.772472; https://doi.org/10.1117/12.772472

ACCESS THE FULL ARTICLE

PERSONAL SIGN IN
Full access may be available with your subscription

Email or Username Forgot your username?

Password Forgot your password?

Show

Remember Email/Username on this computer

Remember Password

No SPIE account? Create an account
or Institutional Sign In via Shibboleth

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $14.40

Non-members: $18.00 ADD TO CART

Show All Keywords

Keywords/Phrases

Search In:

Publication Years