28 March 2008 MAGIC: a European program to push the insertion of maskless lithography
Author Affiliations +
Abstract
With the willingness of the semiconductor industry to push manufacturing costs down, the mask less lithography solution represents a promising option to deal with the cost and complexity concerns about the optical lithography solution. Though a real interest, the development of multi beam tools still remains in laboratory environment. In the frame of the seventh European Framework Program (FP7), a new project, MAGIC, started January 1st 2008 with the objective to strengthen the development of the mask less technology. The aim of the program is to develop multi beam systems from MAPPER and IMS nanofabrication technologies and the associated infrastructure for the future tool usage. This paper draws the present status of multi beam lithography and details the content and the objectives of the MAGIC project.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. Pain, L. Pain, B. Icard, B. Icard, S. Tedesco, S. Tedesco, B. Kampherbeek, B. Kampherbeek, G. Gross, G. Gross, C. Klein, C. Klein, H. Loeschner, H. Loeschner, E. Platzgummer, E. Platzgummer, R. Morgan, R. Morgan, S. Manakli, S. Manakli, J. Kretz, J. Kretz, C. Holhe, C. Holhe, K.-H. Choi, K.-H. Choi, F. Thrum, F. Thrum, E. Kassel, E. Kassel, W. Pilz, W. Pilz, K. Keil, K. Keil, J. Butschke, J. Butschke, M. Irmscher, M. Irmscher, F. Letzkus, F. Letzkus, P. Hudek, P. Hudek, A. Paraskevopoulos, A. Paraskevopoulos, P. Ramm, P. Ramm, J. Weber, J. Weber, } "MAGIC: a European program to push the insertion of maskless lithography", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69211S (28 March 2008); doi: 10.1117/12.772472; https://doi.org/10.1117/12.772472
PROCEEDINGS
12 PAGES


SHARE
Back to Top