Determining the critical size of EUV mask substrate defects

Hakseung Han; Wonil Cho; Kenneth A. Goldberg; Eric M. Gullikson; Chan-Uk Jeon; Stefan Wurm

doi:10.1117/12.772590

21 March 2008 Determining the critical size of EUV mask substrate defects

Hakseung Han, Wonil Cho, Kenneth A. Goldberg, Eric M. Gullikson, Chan-Uk Jeon, Stefan Wurm

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 69211Y (2008) https://doi.org/10.1117/12.772590
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Determining the printability of substrate defects beneath the extreme ultraviolet (EUV) reflecting multilayer stack is an important issue in EUVL lithography. Several simulation studies have been performed in the past to determine the tolerable defect size on EUV mask blank substrates but the industry still has no exact specification based on real printability tests. Therefore, it is imperative to experimentally determine the printability of small defects on a mask blanks that are caused by substrate defects using direct printing of programmed substrate defect in an EUV exposure tool. SEMATECH fabricated bump type program defect masks using standard electron beam lithography and performed printing tests with the masks using an EUV exposure tool. Defect images were also captured using SEMATECH's Berkeley Actinic Imaging Tool in order to compare aerial defect images with secondary electron microscope images from exposed wafers. In this paper, a comprehensive understanding of substrate defect printability will be presented and printability specifications of EUV mask substrate defects will be discussed.

Citation Download Citation

Hakseung Han, Wonil Cho, Kenneth A. Goldberg, Eric M. Gullikson, Chan-Uk Jeon, and Stefan Wurm "Determining the critical size of EUV mask substrate defects", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69211Y (21 March 2008); https://doi.org/10.1117/12.772590

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available