As industry advances towards the insertion of EUVL technology, researchers and manufacturers armed with alpha EUV
light sources invent an expanding array of potential applications utilizing these sources. This in turn drives development
of the light sources to fulfill the large field of specific needs in resist exposure, mirror testing, wafer inspection, etc., which
call for a greater variety of source parameters, including output power, source size, and stability.
The EQ-10 is a commercially available, medium-power (10 W/2π, 13.5nm ±1%, Xenon) electrodeless Z-pinch light
source. Significant field experience and customer feedback has been accumulated from sources already in operation in
multiple locations. In response, a development program is under way to re-engineer and optimize the EQ-10 for a variety
of applications. Data will be presented on the effect of varying source geometry, frequency, and input power on pinch
performance. We have observed a sustained integrated output power of over 15 Watts. The plasma size can be varied to
suit customer applications.
A related program on beamline design and optimization is also underway, focused on debris mitigation while also
maintaining the efficiency of EUV power delivery. Initial results from this program will be summarized.
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