20 March 2008 Rapid directed self-assembly of Lamellar microdomains from a block copolymer containing hybrid
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Proceedings Volume 6921, Emerging Lithographic Technologies XII; 692129 (2008); doi: 10.1117/12.772684
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States
Material properties and directed self-assembly of a block copolymer containing hybrid material are presented in this paper. The hybrid material, which is a mixture of poly(styrene-b-ethylene oxide) (PS-b-PEO) and organosilicate (OS), shows morphologies of microdomains similar to those of organic diblock copolymers depending on the fraction of each phase, i.e. PS and PEO+OS. This material system shows very strong segregation between phases, which provides well defined microdomains in thin films even right after spin coating. The strong segregation also makes it possible to generate microdomains of sub-10 nm length scale regime. The hybrid is found to be directed self-assembly (DSA)- friendly, thus typical topographic and/or chemical guiding patterns can be used for DSA of the hybrid.
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Ho-Cheol Kim, Joy Cheng, Oun-Ho Park, Sang-Min Park, Ricardo Ruiz, Charles T. Black, Jed Pitera, Charles Rettner, Myron Flickner, "Rapid directed self-assembly of Lamellar microdomains from a block copolymer containing hybrid", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692129 (20 March 2008); doi: 10.1117/12.772684; https://doi.org/10.1117/12.772684

Directed self assembly


Scanning electron microscopy


Plasma etching


Picosecond phenomena

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