20 March 2008 Etch-less UV-NIL process for patterning photonic crystal structure onto OLED substrate
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An etch-less ultraviolet nanoimprint lithography (UV-NIL) process is proposed for patterning a photonic crystal (PC) structure onto an organic light-emitting diode (OLED) substrate. In a conventional UV-NIL, anisotropic etching is used to remove the residual layers and to transfer the patterns onto the substrate. The proposed process does not require an etching process. In the process, a stamp with nano-scale PC patterns is pressed on the dispensed resin and UV light is then exposed to cure the resin. After tens of seconds, the stamp is separated from the patterned polymer layer on the substrate. Finally, high-refractive index material is coated onto the layer. The refractive index of the polymer should be very similar to that of glass. The enhancement of the light extraction was assessed by the three-dimensional (3D) finite difference time domain (FDTD) method. The OLED was integrated on a nanoimprinted substrate and the electro-luminance intensity was found to have increased by as much as 50% compared to a conventional device.
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Jun-ho Jeong, Jun-ho Jeong, Sohee Jeon, Sohee Jeon, Jongyoup Shim, Jongyoup Shim, Jae Ryoun Youn, Jae Ryoun Youn, Hyung-Dol Park, Hyung-Dol Park, Jae-Wook Kang, Jae-Wook Kang, Jang-Joo Kim, Jang-Joo Kim, Ki-don Kim, Ki-don Kim, Dae-geun Choi, Dae-geun Choi, Junhyuk Choi, Junhyuk Choi, Dong-Il Lee, Dong-Il Lee, Ali Ozhan Altun, Ali Ozhan Altun, Soon-won Lee, Soon-won Lee, Eung-sug Lee, Eung-sug Lee, Se-Heon Kim, Se-Heon Kim, Yong-Hee Lee, Yong-Hee Lee, } "Etch-less UV-NIL process for patterning photonic crystal structure onto OLED substrate", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69212D (20 March 2008); doi: 10.1117/12.773301; https://doi.org/10.1117/12.773301

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