21 March 2008 Magnetic debris mitigation of a CO2 laser-produced Sn plasma
Author Affiliations +
Abstract
We evaluated the characteristics of Sn debris generated by a CO2 laser (10.6μm) produced plasma. Experiments were performed with bulk Sn-plate targets and Mo/Si multilayer mirror samples were used for debris analysis. We observed very thin and uniform Sn layers of nano/sub-nano size debris particles. The layer deposition rate at 120mm from the plasma is, without magnetic field, about 30nm per million shots. The fundamental magnetic field effect has been confirmed experimentally. The fast Sn ion flux was measured with Faraday cups and the signal decreased by more than 3 orders of magnitude applying a magnetic field of 1T. The Sn deposition on the Mo/Si multilayer mirror decreased in this case by a factor of 4. The contribution of the remaining neutral Sn particles is under study in order to decrease the deposition rate.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoshifumi Ueno, Georg Soumagne, Masato Moriya, Takashi Suganuma, Tamotsu Abe, Hiroshi Komori, Akira Endo, Akira Sumitani, "Magnetic debris mitigation of a CO2 laser-produced Sn plasma", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69212Z (21 March 2008); doi: 10.1117/12.771817; https://doi.org/10.1117/12.771817
PROCEEDINGS
10 PAGES


SHARE
RELATED CONTENT

Performance of one hundred watt HVM LPP-EUV source
Proceedings of SPIE (March 13 2015)
Key components technology update of 100W HVM EUV source
Proceedings of SPIE (March 13 2015)
LPP-EUV light source for HVM lithography
Proceedings of SPIE (January 13 2017)
Scaling of laser produced plasma UTA emission down to 3...
Proceedings of SPIE (September 13 2011)
Present status of laser-produced plasma EUV light source
Proceedings of SPIE (March 22 2010)

Back to Top