LPP EUV light source employing high power C02 laser

Hideo Hoshino; Takashi Suganuma; Takeshi Asayama; Krzysztof Nowak; Masato Moriya; Tamotsu Abe; Akira Endo; Akira Sumitani

doi:10.1117/12.771847

21 March 2008 LPP EUV light source employing high power C0₂ laser

Hideo Hoshino, Takashi Suganuma, Takeshi Asayama, Krzysztof Nowak, Masato Moriya, Tamotsu Abe, Akira Endo, Akira Sumitani

Author Affiliations +

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 692131 (2008) https://doi.org/10.1117/12.771847
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

We are developing a high power CO₂ laser system for a LPP EUV light source. Recent theoretical and experimental data demonstrate the advantages of the combination of a CO₂ laser with a Sn target including the generation of a high CE and low debris plasma with low energy ions and low out-of-band radiation. Our laser system is a short pulse CO₂ MOPA (Master Oscillator Power Amplifier) system with 22 ns pulse width and multi kW average power at 100 kHz repetition rate. We achieved an average laser power of 8 kW with a single laser beam having very good beam quality. A EUV in-band power of 60 W at the intermediate focus was generated irradiating a rotating tin plate with 6 kW laser power.

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Hideo Hoshino, Takashi Suganuma, Takeshi Asayama, Krzysztof Nowak, Masato Moriya, Tamotsu Abe, Akira Endo, and Akira Sumitani "LPP EUV light source employing high power C0₂ laser", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692131 (21 March 2008); https://doi.org/10.1117/12.771847

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