Challenges of OPC model calibration from SEM contours

Yuri Granik; Ir Kusnadi

doi:10.1117/12.772060

24 March 2008 Challenges of OPC model calibration from SEM contours

Yuri Granik, Ir Kusnadi

Proceedings Volume 6922, Metrology, Inspection, and Process Control for Microlithography XXII; 69221H (2008) https://doi.org/10.1117/12.772060
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Traditionally OPC models are calibrated to match CD measurements from selected test pattern locations. This demand for massive CD data drives advances in metrology. Considerable progress has recently been achieved in complimenting this CD data with SEM contours. Here we propose solutions to some challenges that emerge in calibrating OPC models from the experimental contours. We discuss and state the minimization objective as a measure of the distance between simulation and experimental contours. The main challenge is to correctly process inevitable gaps, discontinuities and roughness of the SEM contours. We discuss standardizing the data interchange formats and procedures between OPC and metrology vendors.

Citation Download Citation

Yuri Granik and Ir Kusnadi "Challenges of OPC model calibration from SEM contours", Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69221H (24 March 2008); https://doi.org/10.1117/12.772060

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available