Paper
24 March 2008 Automated creation of production metrology recipes based on design information
Jason P. Cain, Mark Threefoot, Kishan Shah, Bernd Schulz, Stefanie Girol-Gunia, Jon-Tobias Hoeft
Author Affiliations +
Abstract
The volume of measurements and the complexity of metrology recipes in state-of-the-art semiconductor manufacturing have made the conventional manual process of creating the recipes increasingly problematic. To address these challenges, we implemented a system for automatically creating production metrology recipes. We present results from the use of this system for CD-SEM and overlay tools in a high-volume manufacturing environment and show that, in addition to the benefits of reduced engineering time and improved tool utilization, recipes produced by the automated system are in many respects more robust than the equivalent manually created recipes.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jason P. Cain, Mark Threefoot, Kishan Shah, Bernd Schulz, Stefanie Girol-Gunia, and Jon-Tobias Hoeft "Automated creation of production metrology recipes based on design information", Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69221J (24 March 2008); https://doi.org/10.1117/12.773407
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Metrology

Overlay metrology

Pattern recognition

Semiconducting wafers

Detection and tracking algorithms

Scatterometry

Target recognition

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