26 March 2008 Novel molecular resist based on an amorphous truxene derivative
Author Affiliations +
Abstract
A novel molecular resist based on a new amorphous molecule, a truxene derivative, was designed and synthesized. Truxene is characterized as an amorphous solid with a high glass transition temperature (Tg). 70 nm line-and-space (1 : 1) positive pattern was fabricated by the exposure of a low-energy electron beam (5 keV) using the new molecular resist. The new molecular design of resists based on the truxene derivative is promising with regard to development of more efficient molecular resists.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shigeki Hattori, Satoshi Saito, Koji Asakawa, Takeshi Koshiba, Tetsuro Nakasugi, "Novel molecular resist based on an amorphous truxene derivative", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69230J (26 March 2008); doi: 10.1117/12.770944; https://doi.org/10.1117/12.770944
PROCEEDINGS
12 PAGES


SHARE
Back to Top