26 March 2008 Acid-base equilibrium in chemically amplified resist
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Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69231A (2008); doi: 10.1117/12.772165
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States
Abstract
In chemically amplified resists, amines (base compounds) play important roles such as the control of acid diffusion, the sharpening of image slope and the improvement of environmental resistivity of resist materials. However, the details in the reactions between amines and protons in solid films are still unknown. In this research, we have investigated the neutralization of acids by amines in poly(4-hydroxystyrene) (PHS). Proton dynamics in the presence of amines in PHS films is discussed.
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Kenichiro Natsuda, Takahiro Kozawa, Kazumasa Okamoto, Seiichi Tagawa, "Acid-base equilibrium in chemically amplified resist", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231A (26 March 2008); doi: 10.1117/12.772165; https://doi.org/10.1117/12.772165
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KEYWORDS
Chemically amplified resists

Absorption

Polymers

Line edge roughness

Solids

Diffusion

Extreme ultraviolet

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