26 March 2008 High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography
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Abstract
The objective of to develop high refractive index (HRI) chemical amplified resists (CAR), which are composed of HRI photoacid generator (PAG) bound polymer resists, and incorporate HRI nanoparticles into the polymer matrix. Therefore, this new series of nanocomposite resists should be effective for 193 nm immersion lithography with high RI, to obtain feature sizes down to 32 nm or lower.
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Kenneth E. Gonsalves, Kenneth E. Gonsalves, Mingxing Wang, Mingxing Wang, Narahari S. Pujari, Narahari S. Pujari, } "High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231P (26 March 2008); doi: 10.1117/12.770458; https://doi.org/10.1117/12.770458
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