Synthesis of novel alpha-fluoroacrylates and related polymers for immersion lithography

Tsuneo Yamashita; Takuji Ishikawa; Masamichi Morita; Takashi Kanemura; Hirokazu Aoyama

doi:10.1117/12.772262

4 April 2008 Synthesis of novel &agr;-fluoroacrylates and related polymers for immersion lithography

Tsuneo Yamashita, Takuji Ishikawa, Masamichi Morita, Takashi Kanemura, Hirokazu Aoyama

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 69231Z (2008) https://doi.org/10.1117/12.772262
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Immersion lithography is being actively developed toward mass production for 55nm node devices and beyond. Advances are being made toward large depths of focus and higher resolution, but the underlying problem of machine and material cost increases remains. Our work over the past few years has shown that the main-chain fluorinated base resins realized by the co-polymerization of tetrafluoroethylene (TFE) and norbornene derivatives offer high dissolution rates and moderate surface properties. However, it is difficult to synthesis these materials and their high cost is disadvantageous. Recently, we switched our attention to &agr;-fluoroacrylate and have synthesized various monomers and polymers for immersion lithography. &agr;-fluoroacrylate has a polymerization rate faster than acrylate and methacrylate, and its polymers are superior to theirs. In this paper, we will report these synthesis methods and immersion specific properties such as the dissolution rate in standard alkaline solution and water contact angle. Furthermore, we consider with relationship between dissolution rate and polymer structure by infrared method.

Citation Download Citation

Tsuneo Yamashita, Takuji Ishikawa, Masamichi Morita, Takashi Kanemura, and Hirokazu Aoyama "Synthesis of novel &agr;-fluoroacrylates and related polymers for immersion lithography", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231Z (4 April 2008); https://doi.org/10.1117/12.772262

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