26 March 2008 Study of de-protection reaction analysis system for EUV lithography
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Against the backdrop of remarkable strides in recent EUVL research, EUV chemically amplified resists were discussed as a critical issue in last year's International EUVL Symposium. Important concerns involving resists include improvements in resolution and sensitivity and reductions in outgassing and roughness. One important factor in improving resolution and sensitivity is understanding the behavior of the de-protection reaction of a photoresist during EUV exposures. We examined a system to analyze de-protection reactions in an ultra-thin-film process suitable for the EUV resist process.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Sekiguchi, A. Sekiguchi, Y. Kono, Y. Kono, } "Study of de-protection reaction analysis system for EUV lithography", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69232C (26 March 2008); doi: 10.1117/12.773572; https://doi.org/10.1117/12.773572

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