PROCEEDINGS VOLUME 6924
SPIE ADVANCED LITHOGRAPHY | 24-29 FEBRUARY 2008
Optical Microlithography XXI
Editor Affiliations +
Proceedings Volume 6924 is from: Logo
SPIE ADVANCED LITHOGRAPHY
24-29 February 2008
San Jose, California, United States
Front Matter: Volume 6924
Proceedings Volume Optical Microlithography XXI, 692401 (2008) https://doi.org/10.1117/12.797489
Keynote Session
Proceedings Volume Optical Microlithography XXI, 692402 (2008) https://doi.org/10.1117/12.782310
Kevin Lucas, Chris Cork, Alex Miloslavsky, Gerry Luk-Pat, Levi Barnes, John Hapli, John Lewellen, Greg Rollins, Vincent Wiaux, et al.
Proceedings Volume Optical Microlithography XXI, 692403 (2008) https://doi.org/10.1117/12.778267
Proceedings Volume Optical Microlithography XXI, 692404 (2008) https://doi.org/10.1117/12.782311
Double Masking I
Hidefumi Mukai, Eishi Shiobara, Shinya Takahashi, Kohji Hashimoto
Proceedings Volume Optical Microlithography XXI, 692406 (2008) https://doi.org/10.1117/12.773565
Jo Finders, Mircea Dusa, Bert Vleeming, Henry Megens, Birgitt Hepp, Mireille Maenhoudt, Shaunee Cheng, Tom Vandeweyer
Proceedings Volume Optical Microlithography XXI, 692408 (2008) https://doi.org/10.1117/12.772780
Proceedings Volume Optical Microlithography XXI, 692409 (2008) https://doi.org/10.1117/12.774104
Double Masking II
Xiangqun Miao, Lior Huli, Hao Chen, Xumou Xu, Hyungje Woo, Chris Bencher, Jen Shu, Chris Ngai, Christopher Borst
Proceedings Volume Optical Microlithography XXI, 69240A (2008) https://doi.org/10.1117/12.772024
Andrew Carlson, Tsu-Jae King Liu
Proceedings Volume Optical Microlithography XXI, 69240B (2008) https://doi.org/10.1117/12.772049
Woo-Yung Jung, Guee-Hwang Sim, Sang-Min Kim, Choi-Dong Kim, Sung-Min Jeon, Keunjun Kim, Sang-Wook Park, Byung-Seok Lee, Sung-Ki Park, et al.
Proceedings Volume Optical Microlithography XXI, 69240C (2008) https://doi.org/10.1117/12.771092
Nader Shamma, Wen-Ben Chou, Ilia Kalinovski, Don Schlosser, Tom Mountsier, Collin Mui, Raihan Tarafdar, Bart van Schravendijk
Proceedings Volume Optical Microlithography XXI, 69240D (2008) https://doi.org/10.1117/12.771514
Low-k1 Lithography I
Proceedings Volume Optical Microlithography XXI, 69240E (2008) https://doi.org/10.1117/12.772116
Proceedings Volume Optical Microlithography XXI, 69240F (2008) https://doi.org/10.1117/12.771943
Proceedings Volume Optical Microlithography XXI, 69240H (2008) https://doi.org/10.1117/12.772246
Low-k1 Lithography II
Proceedings Volume Optical Microlithography XXI, 69240I (2008) https://doi.org/10.1117/12.771677
Proceedings Volume Optical Microlithography XXI, 69240J (2008) https://doi.org/10.1117/12.775739
Tejas Jhaveri, Andrzej Strojwas, Larry Pileggi, Vyachelav Rovner
Proceedings Volume Optical Microlithography XXI, 69240K (2008) https://doi.org/10.1117/12.776484
Proceedings Volume Optical Microlithography XXI, 69240L (2008) https://doi.org/10.1117/12.771961
Shoji Mimotogi, Masaki Satake, Yosuke Kitamura, Kazuhiro Takahata, Katsuyoshi Kodera, Hiroharu Fujise, Tatsuhiko Ema, Koutaro Sho, Kazutaka Ishigo, et al.
Proceedings Volume Optical Microlithography XXI, 69240M (2008) https://doi.org/10.1117/12.772201
Double Masking III
Proceedings Volume Optical Microlithography XXI, 69240O (2008) https://doi.org/10.1117/12.772891
M. Maenhoudt, R. Gronheid, N. Stepanenko, T. Matsuda, D. Vangoidsenhoven
Proceedings Volume Optical Microlithography XXI, 69240P (2008) https://doi.org/10.1117/12.771884
Christoph Noelscher, Franck Jauzion-Graverolle, Marcel Heller, Matthias Markert, Bee-Kim Hong, Ulrich Egger, Dietmar Temmler
Proceedings Volume Optical Microlithography XXI, 69240Q (2008) https://doi.org/10.1117/12.772750
Simulation I
Vivek Singh, Bin Hu, Kenny Toh, Srinivas Bollepalli, Stephan Wagner, Yan Borodovsky
Proceedings Volume Optical Microlithography XXI, 69240S (2008) https://doi.org/10.1117/12.773248
Linyong Pang, Grace Dai, Tom Cecil, Thuc Dam, Ying Cui, Peter Hu, Dongxue Chen, Ki-Ho Baik, Danping Peng
Proceedings Volume Optical Microlithography XXI, 69240T (2008) https://doi.org/10.1117/12.775084
Sven van Haver, Olaf T. A. Janssen, Joseph J. M. Braat, Augustus J. E. M. Janssen, H. Paul Urbach, Silvania F. Pereira
Proceedings Volume Optical Microlithography XXI, 69240U (2008) https://doi.org/10.1117/12.771872
Proceedings Volume Optical Microlithography XXI, 69240V (2008) https://doi.org/10.1117/12.775121
Proceedings Volume Optical Microlithography XXI, 69240W (2008) https://doi.org/10.1117/12.772572
Simulation II
Paul S. Davids, Srinivas B. Bollepalli
Proceedings Volume Optical Microlithography XXI, 69240X (2008) https://doi.org/10.1117/12.772040
Proceedings Volume Optical Microlithography XXI, 69240Y (2008) https://doi.org/10.1117/12.774443
Toru Fujii, Jun Kogo, Kosuke Suzuki, Masayasu Sawada
Proceedings Volume Optical Microlithography XXI, 69240Z (2008) https://doi.org/10.1117/12.771812
Olaf T. A. Janssen, Sven van Haver, Augustus J. E. M. Janssen, Joseph J. M. Braat, H. Paul Urbach, Silvania F. Pereira
Proceedings Volume Optical Microlithography XXI, 692410 (2008) https://doi.org/10.1117/12.772497
Proceedings Volume Optical Microlithography XXI, 692411 (2008) https://doi.org/10.1117/12.772766
High Index Immersion Lithography
Taiichi Furukawa, Takanori Kishida, Kyouyuu Yasuda, Tsutomu Shimokawa, Zhi Liu, Mark Slezak, Katsuhiko Hieda
Proceedings Volume Optical Microlithography XXI, 692412 (2008) https://doi.org/10.1117/12.771122
Proceedings Volume Optical Microlithography XXI, 692413 (2008) https://doi.org/10.1117/12.771622
Harry Sewell, Jan Mulkens, Paul Graeupner, Diane McCafferty, Louis Markoya, Sjoerd Donders, Rogier Cortie, Ralph Meijers, Fabrizio Evangelista, et al.
Proceedings Volume Optical Microlithography XXI, 692415 (2008) https://doi.org/10.1117/12.773071
V. Liberman, M. Rothschild, S. T. Palmacci, R. Bristol, J. Byers, N. J. Turro, X. Lei, N. O'Connor, P. A. Zimmerman
Proceedings Volume Optical Microlithography XXI, 692416 (2008) https://doi.org/10.1117/12.771462
Roger H. French, Hoang V. Tran, Doug J. Adelman, Nyrissa S. Rogado, Mureo Kaku, Michael Mocella, Charles Y. Chen, Eric Hendrickx, Freida Van Roey, et al.
Proceedings Volume Optical Microlithography XXI, 692417 (2008) https://doi.org/10.1117/12.772105
Process I
Katsushi Nakano, Shiro Nagaoka, Masato Yoshida, Yasuhiro Iriuchijima, Tomoharu Fujiwara, Kenichi Shiraishi, Soichi Owa
Proceedings Volume Optical Microlithography XXI, 692418 (2008) https://doi.org/10.1117/12.772270
Takao Tamura, Naka Onoda, Masafumi Fujita, Takayuki Uchiyama
Proceedings Volume Optical Microlithography XXI, 692419 (2008) https://doi.org/10.1117/12.771598
Chan-Tsun Wu, Hung Ming Lin, Wei-Ming Wu, Meng-Hsun Chan, Benjamin Szu-Min Lin, Kuan-Heng Lin, Andrew J. Hazelton, Toshio Ohhashi, Katsushi Nakano, et al.
Proceedings Volume Optical Microlithography XXI, 69241A (2008) https://doi.org/10.1117/12.772448
Takahito Chibana, Masamichi Kobayashi, Hitoshi Nakano, Mikio Arakawa, Yoichi Matsuoka, Youji Kawasaki, Masayuki Tanabe, Hirohisa Oda
Proceedings Volume Optical Microlithography XXI, 69241B (2008) https://doi.org/10.1117/12.774672
OPC and Mask Technology
Proceedings Volume Optical Microlithography XXI, 69241C (2008) https://doi.org/10.1117/12.773060
Proceedings Volume Optical Microlithography XXI, 69241E (2008) https://doi.org/10.1117/12.776731
Proceedings Volume Optical Microlithography XXI, 69241G (2008) https://doi.org/10.1117/12.772955
Proceedings Volume Optical Microlithography XXI, 69241H (2008) https://doi.org/10.1117/12.773021
Process II
Proceedings Volume Optical Microlithography XXI, 69241I (2008) https://doi.org/10.1117/12.771962
Proceedings Volume Optical Microlithography XXI, 69241J (2008) https://doi.org/10.1117/12.772711
Proceedings Volume Optical Microlithography XXI, 69241K (2008) https://doi.org/10.1117/12.776776
Proceedings Volume Optical Microlithography XXI, 69241L (2008) https://doi.org/10.1117/12.773070
Proceedings Volume Optical Microlithography XXI, 69241M (2008) https://doi.org/10.1117/12.776783
Lithography Tools I
Proceedings Volume Optical Microlithography XXI, 69241N (2008) https://doi.org/10.1117/12.771823
Keiji Yoshimura, Hitoshi Nakano, Hideo Hata, Nobuyoshi Deguchi, Masamichi Kobayashi, Takeaki Ebihara, Yoshio Kawanobe, Tsuneo Kanda
Proceedings Volume Optical Microlithography XXI, 69241O (2008) https://doi.org/10.1117/12.771876
Jan Mulkens, Jos de Klerk, Martijn Leenders, Fred de Jong, Jan Willem Cromwijk
Proceedings Volume Optical Microlithography XXI, 69241P (2008) https://doi.org/10.1117/12.774958
L. Van Look, Joost Bekaert, Peter De Bisschop, Jeroen Van de Kerkhove, Geert Vandenberghe, Koen Schreel, Jasper Menger, Guido Schiffelers, Edwin Knols, et al.
Proceedings Volume Optical Microlithography XXI, 69241Q (2008) https://doi.org/10.1117/12.772598
Vladimir Fleurov, Slava Rokitski, Robert Bergstedt, Hong Ye, Kevin O’Brien, Robert Jacques, Fedor Trintchouk, Efrain Figueroa, Theodore Cacouris, et al.
Proceedings Volume Optical Microlithography XXI, 69241R (2008) https://doi.org/10.1117/12.776927
Proceedings Volume Optical Microlithography XXI, 69241S (2008) https://doi.org/10.1117/12.771942
Lithography Tools II
Hiroshi Nomura, Yohko Furutono
Proceedings Volume Optical Microlithography XXI, 69241T (2008) https://doi.org/10.1117/12.771329
Donis G. Flagello, Bernd Geh, Robert Socha, Peng Liu, Yu Cao, Roland Stas, Oliver Natt, Jörg Zimmermann
Proceedings Volume Optical Microlithography XXI, 69241U (2008) https://doi.org/10.1117/12.773632
Proceedings Volume Optical Microlithography XXI, 69241V (2008) https://doi.org/10.1117/12.772586
Proceedings Volume Optical Microlithography XXI, 69241W (2008) https://doi.org/10.1117/12.773260
Gregory McIntyre, Richard Tu
Proceedings Volume Optical Microlithography XXI, 69241X (2008) https://doi.org/10.1117/12.773123
Poster Session: Double Masking
C. F. Tseng, C. C. Yang, Elvis Yang, T. H. Yang, K. C. Chen, C. Y. Lu
Proceedings Volume Optical Microlithography XXI, 69241Y (2008) https://doi.org/10.1117/12.769904
S. Geisler, J. Bauer, U. Haak, D. Stolarek, K. Schulz, H. Wolf, W. Meier, M. Trojahn, E. Matthus
Proceedings Volume Optical Microlithography XXI, 69241Z (2008) https://doi.org/10.1117/12.771333
Mamoru Terai, Takeo Ishibashi, Masaaki Shinohara, Kazumasa Yonekura, Takuya Hagiwara, Tetsuro Hanawa, Teruhiko Kumada
Proceedings Volume Optical Microlithography XXI, 692420 (2008) https://doi.org/10.1117/12.771855
Huixiong Dai, Chris Bencher, Yongmei Chen, Hyungje Woo, Chris Ngai, Xumou Xu
Proceedings Volume Optical Microlithography XXI, 692421 (2008) https://doi.org/10.1117/12.772260
Proceedings Volume Optical Microlithography XXI, 692422 (2008) https://doi.org/10.1117/12.772345
Yuji Setta, Kazumasa Morishita, Katsuyoshi Kobayashi, Tatsuo Chijimatsu, Satoru Asai
Proceedings Volume Optical Microlithography XXI, 692423 (2008) https://doi.org/10.1117/12.772490
Eunsoo Jeong, Jeahee Kim, Kwangsun Choi, Minkon Lee, Doosung Lee, Myungsoo Kim, Chansik Park
Proceedings Volume Optical Microlithography XXI, 692424 (2008) https://doi.org/10.1117/12.772544
Eiichi Nishimura, Masato Kushibiki, Koichi Yatsuda
Proceedings Volume Optical Microlithography XXI, 692425 (2008) https://doi.org/10.1117/12.772630
Masato Kushibiki, Eiichi Nishimura, Koichi Yatsuda
Proceedings Volume Optical Microlithography XXI, 692426 (2008) https://doi.org/10.1117/12.772669
Umberto Iessi, Sara Loi, Antonio Salerno, Pierluigi Rigolli, Elio De Chiara, Catia Turco, Roberto Colombo, Marco Polli, Antonio Mani
Proceedings Volume Optical Microlithography XXI, 692428 (2008) https://doi.org/10.1117/12.772795
Chandra Sarma, Allen Gabor, Scott Halle, Henning Haffner, Klaus Herold, Len Tsou, Helen Wang, Haoren Zhuang
Proceedings Volume Optical Microlithography XXI, 692429 (2008) https://doi.org/10.1117/12.772985
Proceedings Volume Optical Microlithography XXI, 69242A (2008) https://doi.org/10.1117/12.773030
Nandasiri Samarakone, Paul Yick, Mary Zawadzki, Sang-Jun Choi
Proceedings Volume Optical Microlithography XXI, 69242B (2008) https://doi.org/10.1117/12.774051
Janko Versluijs, J.-F. De Marneffe, Danny Goossens, Maaike Op de Beeck, Tom Vandeweyer, Vincent Wiaux, Herbert Struyf, Mireille Maenhoudt, Mohand Brouri, et al.
Proceedings Volume Optical Microlithography XXI, 69242C (2008) https://doi.org/10.1117/12.774139
Yoshiaki Yamada, Michael M. Crouse, Shannon Dunn, Tetsu Kawasaki, Satoru Shimura, Eiichi Nishimura, Yoshitsugu Tanaka, Judy Galloway, Bill Pierson, et al.
Proceedings Volume Optical Microlithography XXI, 69242D (2008) https://doi.org/10.1117/12.774988
Poster Session: High Index Immersion Lithography
Proceedings Volume Optical Microlithography XXI, 69242F (2008) https://doi.org/10.1117/12.772283
Proceedings Volume Optical Microlithography XXI, 69242G (2008) https://doi.org/10.1117/12.772584
Keita Sakai, Yuichi Iwasaki, Sunao Mori, Akihiro Yamada, Makoto Ogusu, Keiji Yamashita, Tomofumi Nishikawara, Takatoshi Tanaka, Noriyasu Hasegawa, et al.
Proceedings Volume Optical Microlithography XXI, 69242H (2008) https://doi.org/10.1117/12.775142
Emil C. Piscani, Dominic Ashworth, Jeff Byers, Chris Van Peski, Paul Zimmerman, Bryan J. Rice
Proceedings Volume Optical Microlithography XXI, 69242I (2008) https://doi.org/10.1117/12.775474
Poster Session: Lithography Tools
Proceedings Volume Optical Microlithography XXI, 69242J (2008) https://doi.org/10.1117/12.771213
Teruhiko Nawata, Yoji Inui, Toshiro Mabuchi, Naoto Mochizuki, Isao Masada, Eiichi Nishijima, Hiroki Sato, Tsuguo Fukuda
Proceedings Volume Optical Microlithography XXI, 69242L (2008) https://doi.org/10.1117/12.771786
Proceedings Volume Optical Microlithography XXI, 69242O (2008) https://doi.org/10.1117/12.774666
K. Mann, A. Bayer, U. Leinhos, T. Miege, B. Schäfer
Proceedings Volume Optical Microlithography XXI, 69242P (2008) https://doi.org/10.1117/12.775453
Kevin O'Brien, Wayne J. Dunstan, Daniel Riggs, Aravind Ratnam, Robert Jacques, Herve Besaucele, Daniel Brown, Kevin Zhang, Nigel Farrar
Proceedings Volume Optical Microlithography XXI, 69242Q (2008) https://doi.org/10.1117/12.777209
Takahito Kumazaki, Toru Suzuki, Satoshi Tanaka, Ryoichi Nohdomi, Masaya Yoshino, Shinichi Matsumoto, Yasufumi Kawasuji, Hiroshi Umeda, Hitoshi Nagano, et al.
Proceedings Volume Optical Microlithography XXI, 69242R (2008) https://doi.org/10.1117/12.778149
Masaya Yoshino, Hiroaki Nakarai, Takeshi Ohta, Hitoshi Nagano, Hiroshi Umeda, Yasufumi Kawasuji, Toru Abe, Ryoichi Nohdomi, Toru Suzuki, et al.
Proceedings Volume Optical Microlithography XXI, 69242S (2008) https://doi.org/10.1117/12.778430
Proceedings Volume Optical Microlithography XXI, 69242T (2008) https://doi.org/10.1117/12.790828
Poster Session: Low-k1 Lithography
Proceedings Volume Optical Microlithography XXI, 69242U (2008) https://doi.org/10.1117/12.771369
Proceedings Volume Optical Microlithography XXI, 69242V (2008) https://doi.org/10.1117/12.773049
Proceedings Volume Optical Microlithography XXI, 69242W (2008) https://doi.org/10.1117/12.773075
Sho-Shen Lee, Cheng-Han Wu, Yongfa Huang, Chien-Hui Huang, Hung-Chin Huang, George KC Huang, Chun-Chi Yu, Michael Hsu, Simon Shieh, et al.
Proceedings Volume Optical Microlithography XXI, 69242X (2008) https://doi.org/10.1117/12.773137
Jo Finders, Eddy Van der Heijden, Gert-Jan Janssen, Rik Vangheluwe, Tsuysohi Shibata, Ryouichirou Naitou, Hitoshi Kosugi, Hisanori Sugimachi
Proceedings Volume Optical Microlithography XXI, 69242Y (2008) https://doi.org/10.1117/12.773595
V. Farys, F. Robert, C. Martinelli, Y. Trouiller, F. Sundermann, C. Gardin, J. Planchot, G. Kerrien, F. Vautrin, et al.
Proceedings Volume Optical Microlithography XXI, 69242Z (2008) https://doi.org/10.1117/12.774091
Mary Coles, Yong Seok Choi, Kyoungmo Yang, Cindy Parker, Andy Self
Proceedings Volume Optical Microlithography XXI, 692430 (2008) https://doi.org/10.1117/12.775808
T. S. Wu, Elvis Yang, T. H. Yang, K. C. Chen, C. Y. Lu
Proceedings Volume Optical Microlithography XXI, 692431 (2008) https://doi.org/10.1117/12.770882