12 March 2008 High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches
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Abstract
We have performed high-index immersion fluid studies to define the levels of both soluble and insoluble impurities present. These studies have also revealed the importance of process materials' purity in fluid contact. Fluid interactions with resist, leading to both surface and imaging defects, can be minimized by proper resist selection. Our Active Recycle Package technology can greatly extend the useful life of both the fluid itself, as well as the final lens element.
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Roger H. French, Roger H. French, Hoang V. Tran, Hoang V. Tran, Doug J. Adelman, Doug J. Adelman, Nyrissa S. Rogado, Nyrissa S. Rogado, Mureo Kaku, Mureo Kaku, Michael Mocella, Michael Mocella, Charles Y. Chen, Charles Y. Chen, Eric Hendrickx, Eric Hendrickx, Freida Van Roey, Freida Van Roey, Adam S. Bernfeld, Adam S. Bernfeld, Rebekah A. Derryberry, Rebekah A. Derryberry, } "High-index immersion fluids enabling cost-effective single-exposure lithography for 32 nm half pitches", Proc. SPIE 6924, Optical Microlithography XXI, 692417 (12 March 2008); doi: 10.1117/12.772105; https://doi.org/10.1117/12.772105
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