1 April 2008 Optimization procedure of exposure tools with polarization aberrations
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Abstract
In the Hyper-NA immersion age, it is essential to optimize all optical parameters, and so exposure tools must have functions to precisely control the parameters. There have been various reports indicating that polarization aberrations of projection optics affect imaging performance, but there have been few reports on reducing their influence in tools. We have developed a new method to optimize imaging performance with polarization taken into account. This paper describes a theoretical analysis of polarization with Pauli decomposition. A strict vectorial calculation of optical images matches our expression. Then, our solver software can determine the optimum conditions of all aberration parameters of exposure tools for specific IC patterns.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tadashi Arai, Tadashi Arai, Akihiro Yamada, Akihiro Yamada, Kenichiro Mori, Kenichiro Mori, Yoshinori Osaki, Yoshinori Osaki, Toshiyuki Yoshihara, Toshiyuki Yoshihara, Yasuo Hasegawa, Yasuo Hasegawa, } "Optimization procedure of exposure tools with polarization aberrations", Proc. SPIE 6924, Optical Microlithography XXI, 69241I (1 April 2008); doi: 10.1117/12.771962; https://doi.org/10.1117/12.771962
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