1 April 2008 Proposal for determining exposure latitude requirements
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Abstract
To determine the magnitude of the exposure latitude required for a process to be manufacturable, additional factors are considered that have a similar relationship between linewidth variation and image log-slope. Such parameters include resist thickness, flare, post-exposure bake temperature, and line-edge roughness. To obtain consistency between theory and experiment it is necessary to use the resist-edge log-slope generalization of image log-slope. Inclusion of these additional factors increases the required exposure latitude five to six times more than would be considered necessary from exposure tool dose control alone.
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Harry J. Levinson, Yuansheng Ma, Marcel Koenig, Bruno La Fontaine, Rolf Seltmann, "Proposal for determining exposure latitude requirements", Proc. SPIE 6924, Optical Microlithography XXI, 69241J (1 April 2008); doi: 10.1117/12.772711; https://doi.org/10.1117/12.772711
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