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7 March 2008 Determining DOF requirements needed to meet technology process assumptions
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Abstract
Depth of Focus (DOF) and exposure latitude requirements have long been ambiguous. Techniques range from scaling values from previous generations to summing individual components from the scanner. Even more ambiguous is what critical dimension (CD) variation can be allowed to originate from dose and focus variation. In this paper we discuss a comprehensive approach to measuring focus variation that a process must be capable of handling. We also describe a detailed methodology to determine how much CD variation can come from dose and focus variation. This includes examples of the statistics used to combine individual components of CD, dose and focus variation.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Allen Gabor, Andrew Brendler, Bernhard Liegl, Colin Brodsky, Gerhard Lembach, Scott Mansfield, Shailendra Mishra, Timothy Brunner, Timothy Wiltshire, Vinayan Menon, and Wai-kin Li "Determining DOF requirements needed to meet technology process assumptions", Proc. SPIE 6924, Optical Microlithography XXI, 69241L (7 March 2008); https://doi.org/10.1117/12.773070
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