7 March 2008 Recent performance results of Nikon immersion lithography tools
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Nikon's production immersion scanners, including the NSR-S609B and the NSR-S610C, have now been in the field for over 2 years. With these tools, 55 nm NAND Flash processes became the first immersion production chips in the world, and 45 nm NAND Flash process development and early production has begun. Several logic processes have also been developed on these tools. This paper discusses the technical features of Nikon's immersion tools, and their results in production.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew J. Hazelton, Andrew J. Hazelton, Kenichi Shiraishi, Kenichi Shiraishi, Shinji Wakamoto, Shinji Wakamoto, Yuuki Ishii, Yuuki Ishii, Masahiko Okumura, Masahiko Okumura, Nobutaka Magome, Nobutaka Magome, Hiroyuki Suzuki, Hiroyuki Suzuki, } "Recent performance results of Nikon immersion lithography tools", Proc. SPIE 6924, Optical Microlithography XXI, 69241N (7 March 2008); doi: 10.1117/12.771823; https://doi.org/10.1117/12.771823

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