Monitoring polarization at 193nm high-numerical aperture with phase shift masks: experimental results and industrial outlook

Gregory McIntyre; Richard Tu

doi:10.1117/12.773123

12 March 2008 Monitoring polarization at 193nm high-numerical aperture with phase shift masks: experimental results and industrial outlook

Gregory McIntyre, Richard Tu

Author Affiliations +

Proceedings Volume 6924, Optical Microlithography XXI; 69241X (2008) https://doi.org/10.1117/12.773123
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

This paper will provide experimental results of Phase-Shift Mask (PSM) Polarimetry, a previously introduced resistbased polarization monitoring technique that employs a specialized chromeless phase-shifting test reticle. The patterns derived from high-NA proximity effects have proven to be 2 to 3 times more sensitive to polarization than a previously reported generation of patterns. Example results in this paper show that for a numerical aperture (NA) of 0.93, this technique is likely capable of measuring the intensity in the preferred polarization state (IPS) to within about 3%. Data from a follow-on reticle for NAs up to 1.35 is expected soon and promises to measure IPS to within about 1.5%. This is expected to suffice for monitoring polarization at the 22nm node for water-based immersion tools over time or from tool to tool. This technique is extendable and likely offers even greater sensitivity for high-index immersion lithography, should NAs greater than 1.35 become available. Advantages and disadvantages of this technique will be addressed.

Citation Download Citation

Gregory McIntyre and Richard Tu "Monitoring polarization at 193nm high-numerical aperture with phase shift masks: experimental results and industrial outlook", Proc. SPIE 6924, Optical Microlithography XXI, 69241X (12 March 2008); https://doi.org/10.1117/12.773123

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