17 March 2008 Multi-patterning overlay control
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Abstract
The extension of optical lithography to 32nm and beyond is dependent on double-patterning (DP) at critical levels. DP integration strategies result in added degrees of freedom for overlay variation. In particular, overlay control requires assessment of error among various mask/level combinations. The Blossom overlay metrology approach minimizes the size of the overlay marks associated with each mask/level while maximizing the density of marks within the overlay metrology tool's field of view (FOV). We examine Blossom enabled use cases in DP lithography control; specifically, within-field and multiple mask/level sampling.
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C. P. Ausschnitt, P. Dasari, "Multi-patterning overlay control", Proc. SPIE 6924, Optical Microlithography XXI, 692448 (17 March 2008); doi: 10.1117/12.772865; https://doi.org/10.1117/12.772865
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