4 March 2008 DfM lessons learned from altPSM design
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The design challenges associated with alternating phase shifted mask lithography are discussed, solutions which had been developed to address these challenges are reviewed, and parallels to current design for manufacturability implementation issues are identified. Leveraging these insights, the positive attributes of a well integrated design for manufacturability enhanced design flow are proposed. Specific topics covered in the paper are: the need to complement error-detection with streamlined layout-correction, the risk of providing too much unstable information too early in the design optimization flow, the efficiencies of prescriptive 'correct-by-construction' solutions, and the need for seamless integration into existing design flows. For the benefit of the non-lithographer, the discussion of these detailed topics is preceded by a brief review of alternating phase shifted mask lithography principles and benefits.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lars Liebmann, Lars Liebmann, Zak Baum, Zak Baum, Ioana Graur, Ioana Graur, Don Samuels, Don Samuels, } "DfM lessons learned from altPSM design", Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69250C (4 March 2008); doi: 10.1117/12.771974; https://doi.org/10.1117/12.771974


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