12 March 2008 An extraction of repeating patterns from OPCed layout data
Author Affiliations +
As the feature size of LSI becomes smaller, the increase of mask manufacturing cost is becoming critical. Association of Super-Advanced Electronics Technologies (ASET) started a 4-year project aiming at the reduction of mask manufacturing cost and TAT by the optimization of MDP, mask writing, and mask inspection in 2006 under the sponsorship of New Energy and Industrial Technology Development Organization (NEDO) [1]. In the project, the optimization is being pursued from the viewpoints of "common data format", "pattern prioritization", "repeating patterns", and "parallel processing" in MDP, mask writing, and mask inspection. In the total optimization, "repeating patterns" are applied to the mask writing using character projection (CP) and efficient review in mask inspection. In this paper, we describe a new method to find repeating patterns from OPCed layout data after fracturing. We found that using the new method efficient extraction of repeating patterns even from OPCed layout data is possible and shot count of mask writing decreases greatly.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoshihiro Fujimoto, Yoshihiro Fujimoto, Masahiro Shoji, Masahiro Shoji, Kokoro Kato, Kokoro Kato, Tadao Inoue, Tadao Inoue, Masaki Yamabe, Masaki Yamabe, } "An extraction of repeating patterns from OPCed layout data", Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69250Y (12 March 2008); doi: 10.1117/12.771836; https://doi.org/10.1117/12.771836

Back to Top