Accurate model base verification scheme to eliminate hotspots and manage warmspots

Shigeki Nojima; Suigen Kyoh; Shimon Maeda; Soichi Inoue

doi:10.1117/12.771856

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18 March 2008 Accurate model base verification scheme to eliminate hotspots and manage warmspots

Shigeki Nojima; Suigen Kyoh; Shimon Maeda; Soichi Inoue

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Proceedings Volume 6925, Design for Manufacturability through Design-Process Integration II; 69250Z (2008) https://doi.org/10.1117/12.771856
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Lithography compliance check (LCC), which is verification of layouts using lithography simulation, is an essential step under the current low k1 lithography condition. However a conventional LCC scheme does not consider process proximity effect (PPE) differences among several manufacturing tools, especially for exposure tools. In this paper two concepts are proposed. One is PPE monitoring and matching using warmspots. The warmspots are patterns that have small process window. They are sensitive to difference of illumination conditions and are basically 2-dimensional patterns. The other is LCC using multiple simulation models that represent each PPE on exposure tools. All layouts are verified by these models and the layouts are fixed if hotspots (catastrophic failure on wafer) are found. This verification step is repeated until all hotspots are eliminated from the layouts. Based on these concepts, robust cell layouts that have no hotspot under the several PPE conditions are created.

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Shigeki Nojima, Suigen Kyoh, Shimon Maeda, and Soichi Inoue "Accurate model base verification scheme to eliminate hotspots and manage warmspots", Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69250Z (18 March 2008); https://doi.org/10.1117/12.771856

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