1 April 2008 A new robust process window qualification (PWQ) technique to perform systematic defect characterization to enlarge the lithographic process window using a die-to-database verification tool (NGR2100)
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Abstract
A new Robust Process Window Qualification (PWQ) Technique to perform systematic defect characterization to enlarge the Lithographic process window is described, using a Die-to-Database Verification Tool (NGR2100).
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tadashi Kitamura, Tadashi Kitamura, Toshiaki Hasebe, Toshiaki Hasebe, Kazufumi Kubota, Kazufumi Kubota, Futoshi Sakai, Futoshi Sakai, Shinichi Nakazawa, Shinichi Nakazawa, Michael Hoffman, Michael Hoffman, Masahiro Yamamoto, Masahiro Yamamoto, Masahiro Inoue, Masahiro Inoue, } "A new robust process window qualification (PWQ) technique to perform systematic defect characterization to enlarge the lithographic process window using a die-to-database verification tool (NGR2100)", Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 692519 (1 April 2008); doi: 10.1117/12.772706; https://doi.org/10.1117/12.772706
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