19 March 2008 Layout patterning check for DFM
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Design rules and the design rule check (DRC) utility are conventional approaches to design for manufacturability (DFM). The DRC utility is based on unsophisticated rules to check the design layout in a simple environment. As the design dimension shrinks drastically, the introduction of a more powerful DFM utility with model-based layout patterning check (LPC) becomes mandatory for designers to filter process weak-points before taping out layouts. In this paper, a system of integrated hotspot scores consisting of three lithography sensitive indexes is proposed to assist designers to circumvent risky layout patterns in lithography. With the hotspot fixing guideline and the hotspot severity classification deduced from the scoring system provided in this paper, designers can deliver much more manufacturable designs.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. C. Chang, I. C. Shih, J. F. Lin, Y. S. Yen, C. M. Lai, W. C. Huang, R. G. Liu, and Y. C. Ku "Layout patterning check for DFM", Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69251R (19 March 2008); doi: 10.1117/12.775420; https://doi.org/10.1117/12.775420

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