19 February 2008 The investigation of excimer XeF* (~354 nm) emission efficiency at excitation Xe/SF6 mixture by barrier discharge
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Proceedings Volume 6938, Atomic and Molecular Pulsed Lasers VII; 693817 (2008) https://doi.org/10.1117/12.785688
Event: Atomic and Molecular Pulsed Lasers VII, 2007, Tomsk, Russian Federation
Abstract
The results of investigations of dielectric barrier discharges parameters and UV-emission of Xe/SF6 (50:1) mixture related to the pressure and the distance between electrodes are presented. The basic source of UV-emission in Xe/SF6 mixture is XeF* excimer, whose emission band center is positioned at 354 nm. The mixture pressure was varied in the range from 40 to 180 Torr, and the distance between electrodes changed in range from 3 to 11 mm. The distance between the electrodes and the gas pressure were selected out so that pd-product should be constant. The experiments conducted display that for pd = const in the pressure range of 70-180 Torr there are some regularities which are partly similar to the scaling laws of gas discharge, namely: the current density ~ const; the power dissipated by the discharge ~ 1/p0.3; UV emission power ~ 1/p; the efficiency of lamp ~ 1/p0.8; the current pulse duration ~ 1/p0.3. The highest efficiency (6-8%) was reached for 30-50 Torr gas pressure.
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A. A. Pikulev, A. A. Pikulev, V. M. Tsvetkov, V. M. Tsvetkov, } "The investigation of excimer XeF* (~354 nm) emission efficiency at excitation Xe/SF6 mixture by barrier discharge", Proc. SPIE 6938, Atomic and Molecular Pulsed Lasers VII, 693817 (19 February 2008); doi: 10.1117/12.785688; https://doi.org/10.1117/12.785688
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