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30 April 2008 Wiregrid micro-polarizers for mid-infrared applications
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Abstract
Simultaneous detection of intensity and polarization at the pixel-level has many important applications in the mid-infrared region. In this work a large-format aluminum wire grid micro polarizer array has been fabricated and tested on silicon substrates. The arrays were made on 150mm silicon wafers using a 193nm deep-UV stepper, with each array spanning over 1-million pixels. A unique multilayer design and a large-area nanoscale projection lithography combined with high-aspect ratio wire-grid structures were utilized to achieve optimum extinction coefficient and transmission. Measured extinction coefficients on test samples exceeded 30-dB, with maximum transmission around 90%. These arrays could be designed to match the focal-plane array geometry for integration with mid-IR imagers.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew M. Sarangan, Aziz Mahfoud, Zhi Wu, Qiwen Zhan, David P. Forrai, Darrel W. Endres, John W. Devitt, Robert T. Mack, and James S. Harris "Wiregrid micro-polarizers for mid-infrared applications", Proc. SPIE 6959, Micro (MEMS) and Nanotechnologies for Space, Defense, and Security II, 695915 (30 April 2008); https://doi.org/10.1117/12.778028
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