11 March 2008 Fabrication and physical properties of high-quality zinc oxide thin films
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Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69840S (2008) https://doi.org/10.1117/12.792356
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China
Abstract
In this paper, ZnO thin films with a polycrystalline preferential orientation and low surface roughness were successively achieved on Si (100) substrate by RF magnetron sputtering techniques under optimized experimental parameters. In our sputtered samples, the average grain size is around 15~23 nm calculated from Scherrer Formula, and transmittance in visible range was over 80% measured by spectrophotometer, d33 equal to 27.5 pV/m measured by Piezoelectric Force Microscopy (PFM), surface roughness is below 3.00 nm and a good (002) plane orientation growth observed from XRD patterns. All the excellence properties of the ZnO thin films we acquired signal them are promising materials to be applied in electronic devices.
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Bo Zhou, Bo Zhou, Jinliang Wang, Jinliang Wang, Yadong Pan, Yadong Pan, Li Wang, Li Wang, Hongyong Peng, Hongyong Peng, } "Fabrication and physical properties of high-quality zinc oxide thin films", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69840S (11 March 2008); doi: 10.1117/12.792356; https://doi.org/10.1117/12.792356
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