11 March 2008 Influence of substrates on the nucleation behaviour of nanocrystalline diamond films
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Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 698418 (2008) https://doi.org/10.1117/12.792392
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China
Abstract
Nanocrystalline diamond (NCD) films have been deposited by hot filament chemical vapour deposition (HFCVD) from acetone/hydrogen gas mixtures on a variety of substrates such as silicon wafers and polycrystalline diamond. The influence of the chemical nature of the substrate, the roughness, and the pretreatment of the substrates on the nucleation and the bulk structure of the NCD films are investigated. By means of X-ray diffraction (XRD) and Raman spectroscopy it is shown that the bulk properties of the films are not affected by the status of the substrate although these have a strong influence on the nucleation behaviour.
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Jinyong Xu, Jinyong Xu, Yiben Xia, Yiben Xia, Linjun Wang, Linjun Wang, Jianmin Liu, Jianmin Liu, Jian Huang, Jian Huang, Hongyan Pen, Hongyan Pen, Guang Hu, Guang Hu, Xuefeng Zhu, Xuefeng Zhu, } "Influence of substrates on the nucleation behaviour of nanocrystalline diamond films", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 698418 (11 March 2008); doi: 10.1117/12.792392; https://doi.org/10.1117/12.792392
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