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An optimal energy interval in ion-assisted deposition of high crystalline films is predicted in the modeling of ion
impacting on surface. The result is in good agreement with the presented experiments. The possible application of the
evaluation of ion role for the fabrication of potential thin film materials is expected.
Z. Q. Ma,C. B. Feng,X. Tang,F. Li,B. He, andB. B. Shi
"The role of ion-assisted deposition in PVD", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 698420 (11 March 2008); https://doi.org/10.1117/12.792012
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Z. Q. Ma, C. B. Feng, X. Tang, F. Li, B. He, B. B. Shi, "The role of ion-assisted deposition in PVD," Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 698420 (11 March 2008); https://doi.org/10.1117/12.792012