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11 March 2008 Substrate effect on the growth and thermal electrical properties of vanadium oxide thin films
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Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69842J (2008) https://doi.org/10.1117/12.792139
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China
Abstract
Vanadium oxide (VOx) thin films were deposited on different substrates by reactive DC magnetron sputtering. Silicon substrate, Si3N4/Si substrate, glass substrate, and α-Al2O3 substrate were adopted in experiments. Results revealed that the structural features of VOx thin films strongly depend on the substrates. Analysis of square resistance and its temperature dependence demonstrated that the crystal structure and the growth mode of VOx films play important roles in the film electrical properties. Experiments demonstrated that substrates have great influence on the growth mode and thermal resistance properties of VOx thin films.
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Xiongbang Wei, Zhiming Wu, Xiangdong Xu, Tao Wang, Jingjing Tang, and Yadong Jiang "Substrate effect on the growth and thermal electrical properties of vanadium oxide thin films", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842J (11 March 2008); https://doi.org/10.1117/12.792139
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