11 March 2008 Thick and adherent (cBN/nano-diamond)3 multilayer films deposited by RF magnetron sputtering
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Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69842S (2008) https://doi.org/10.1117/12.792275
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China
Abstract
Using physical vapor deposition (PVD) method, the (cBN/nano-diamond)3 multilayer film with phase purity, high hardness and low residual stress was synthesized on silicon substrates supported by a thick nano-diamond buffer. This method presented is characteristic with the direct cBN growth on diamond without soft, non-cubic BN interface layers; the synthesis of multilayer films with extraordinary adhesion to the substrates and higher hardness than a cBN single film, and the stress of the multilayer film can be reduced to only one forth of that of a cBN single film. These prime technological properties open the route to the mechanical exploitation of cBN films.
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H. Q. Li, K. M. Leung, W. J. Zhang, "Thick and adherent (cBN/nano-diamond)3 multilayer films deposited by RF magnetron sputtering", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842S (11 March 2008); doi: 10.1117/12.792275; https://doi.org/10.1117/12.792275
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