Paper
11 March 2008 Surface properties and field emission of BN and BCN films
Takashi Sugino, Chiharu Kimura, Hidemitsu Aoki
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Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 698434 (2008) https://doi.org/10.1117/12.792391
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China
Abstract
Synthesis of boron nitride (BN) and boron carbon nitride (BCN) films is carried out by plasma-assisted chemical vapor deposition. The electron affinity of the BN and BCN films is estimated from the threshold energy of the photoelectron yield and the bandgap energy. The negative electron affinity appears on the BN surface, while the positive electron affinity increases on the BCN surface with increasing C composition ratio. It is found that a reduction in the electron affinity occurs due to N2 plasma treatment rather than H2 plasma treatment for the BCN film. Field emission characteristics of the BN and BCN nanofilms are investigated. The turn-on electric field of the electron emission does not increase in the region of the C composition ratio lower than 20 %. This is due to the effects of increasing electron affinity and decreasing conduction band discontinuity between the BCN nanofilm and Si substrate. It is demonstrated that field emission characteristics of the graphite nanofiber are improved significantly by coating with BN nanofilm.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takashi Sugino, Chiharu Kimura, and Hidemitsu Aoki "Surface properties and field emission of BN and BCN films", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 698434 (11 March 2008); https://doi.org/10.1117/12.792391
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KEYWORDS
Plasma

Plasma treatment

Surface roughness

Silicon

Surface properties

Boron

Absorption

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