Micromachining of InP/InGaAs multiple membrane/airgap structures for tunable optical devices

T. Kusserow; S. Ferwana; T. Nakamura; T. Hayakawa; N. Dharmarasu; B. Vengatesan; H. Hillmer

doi:10.1117/12.781359

25 April 2008 Micromachining of InP/InGaAs multiple membrane/airgap structures for tunable optical devices

T. Kusserow, S. Ferwana, T. Nakamura, T. Hayakawa, N. Dharmarasu, B. Vengatesan, H. Hillmer

Proceedings Volume 6993, MEMS, MOEMS, and Micromachining III; 69930B (2008) https://doi.org/10.1117/12.781359
Event: SPIE Photonics Europe, 2008, Strasbourg, France

Abstract

InP based tunable optical MEMS devices, such as Fabry-Perot filters, VCSELs, photodiodes, consist of two distributed Bragg reflectors (DBRs) and a cavity. Tuning of the filter wavelength is achieved by electrostatic actuation of the two DBRs which are p-doped and n-doped, respectively, and reversely biased. The cavity and the DBRs consist of a stress compensated InP/airgap structure which is fabricated by sacrificial layer removal, using FeCl3 wet etching of InGaAs layers. In this work we investigated the influence of p-and n-type conductivity on the etching process. We observed that the sacrificial layer etch rate of n-InGaAs is 7 times slower than the p-InGaAs. This influences the stress in the n-DBR section of the tunable device. Based on these results novel wavelength tunable optical devices with multiple InP membrane/airgap structures will be designed.

Citation Download Citation

T. Kusserow, S. Ferwana, T. Nakamura, T. Hayakawa, N. Dharmarasu, B. Vengatesan, and H. Hillmer "Micromachining of InP/InGaAs multiple membrane/airgap structures for tunable optical devices", Proc. SPIE 6993, MEMS, MOEMS, and Micromachining III, 69930B (25 April 2008); https://doi.org/10.1117/12.781359

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