Development features in large-range nanoscale coordinate metrology

Martin Gruhlke; Christian Recknagel; Hendrik Rothe

doi:10.1117/12.780821

25 April 2008 Development features in large-range nanoscale coordinate metrology

Martin Gruhlke, Christian Recknagel, Hendrik Rothe

Proceedings Volume 6995, Optical Micro- and Nanometrology in Microsystems Technology II; 69950B (2008) https://doi.org/10.1117/12.780821
Event: SPIE Photonics Europe, 2008, Strasbourg, France

Abstract

The Nanometer-Coordinate-Measuring-Machine (NCMM) has the ability to scan large areas at nanometer resolution for the purpose of quality assurance of nanostructured products. The device combines a conventional atomic force microscope (AFM) with a precise positioning system. By locating the AFM at a fixed point and moving the sample with the positioning system a scan range of 2.5 x 2.5 x 0.5 cm³ and a repeatability of 0.1 nm is achieved. Since all movements of the positioning system are measured via laser interferometers, the Abbe-principle is kept in every dimension, the use of materials with a low thermal expansion coefficient (like Zerodur and FeNi36) and an overall coordinate system the system provides unique measurement conditions (traceability to the meter definition; repeatable and fast scans of the region of interest). In the past the NCMM was used to make the first large area scan of a microelectronic sample. Our present work focuses on automating critical dimension measurement through the use of a-priori-knowledge of the sample and optical navigation. A-priori-knowledge can be generated by the use of CAD-Data of the sample or scans with white light interferometry. Another present objective is the optimization of the measurement parameters for specific sample topologies using simulation and also empirical methods like the Ziegler-Nichols method. The need of efficient data processing and handling is also part of our current research.

Citation Download Citation

Martin Gruhlke, Christian Recknagel, and Hendrik Rothe "Development features in large-range nanoscale coordinate metrology", Proc. SPIE 6995, Optical Micro- and Nanometrology in Microsystems Technology II, 69950B (25 April 2008); https://doi.org/10.1117/12.780821

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