1 May 2008 Experimental verification of finesse enhancement scheme in two-ring resonator system
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Abstract
We propose a finesse enhancement scheme by a simple two-ring system, in which the resonance finesse is dependent on the relative intensity buildup of the second ring with respect to the first. In lossless case, it is possible to obtain finesse two orders of magnitude higher than that of the single ring system. The two-ring system is fabricated in silicon-on-insulator using deep UV (DUV) lithography and shown to exhibit the finesse of 100 to 300. The associated finesse enhancement of 20 is in a good agreement with the theory.
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Landobasa Y. M. Tobing, Desmond C. S. Lim, Pieter Dumon, Roel Baets, Mee-Koy Chin, "Experimental verification of finesse enhancement scheme in two-ring resonator system", Proc. SPIE 6996, Silicon Photonics and Photonic Integrated Circuits, 69960B (1 May 2008); doi: 10.1117/12.780933; https://doi.org/10.1117/12.780933
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