Paper
1 May 2008 Experimental verification of finesse enhancement scheme in two-ring resonator system
Landobasa Y. M. Tobing, Desmond C. S. Lim, Pieter Dumon, Roel Baets, Mee-Koy Chin
Author Affiliations +
Abstract
We propose a finesse enhancement scheme by a simple two-ring system, in which the resonance finesse is dependent on the relative intensity buildup of the second ring with respect to the first. In lossless case, it is possible to obtain finesse two orders of magnitude higher than that of the single ring system. The two-ring system is fabricated in silicon-on-insulator using deep UV (DUV) lithography and shown to exhibit the finesse of 100 to 300. The associated finesse enhancement of 20 is in a good agreement with the theory.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Landobasa Y. M. Tobing, Desmond C. S. Lim, Pieter Dumon, Roel Baets, and Mee-Koy Chin "Experimental verification of finesse enhancement scheme in two-ring resonator system", Proc. SPIE 6996, Silicon Photonics and Photonic Integrated Circuits, 69960B (1 May 2008); https://doi.org/10.1117/12.780933
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Waveguides

Resonators

Deep ultraviolet

Silicon

Microrings

Resonance enhancement

CMOS technology

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