1 May 2008 Echelle grating WDM (de-)multiplexers in SOI technology, based on a design with two stigmatic points
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We present ultra-compact integrated optical echelle grating WDM (de-)multiplexers for on-chip optical networks. These devices are based on a design with two stigmatic points. The devices were fabricated using Silicon-On-Insulator (SOI) photonic waveguide technology thus the smallest version of the (de-)multiplexer occupies an area of only 250x200 μm. We will show measurement results on different variations of the echelle grating devices. In the measurements, we found a channel to channel isolation of 19 dB. The minimum insertion loss, relative to a straight waveguide, is only 3 dB with a channel to channel variation of 0.5 dB.nefit of the numerical reconstruction properties of DH in combination with diffraction grating to get super-resolution. Various attempts have been performed and results are presented and discussed. The approaches could be used for metrology and imaging application in various fields of engineering and biology.
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F. Horst, William M. J. Green, B. J. Offrein, Yurii Vlasov, "Echelle grating WDM (de-)multiplexers in SOI technology, based on a design with two stigmatic points", Proc. SPIE 6996, Silicon Photonics and Photonic Integrated Circuits, 69960R (1 May 2008); doi: 10.1117/12.781232; https://doi.org/10.1117/12.781232

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