1 May 2008 Low loss, high contrast planar optical waveguides based on low-cost CMOS compatible LPCVD processing
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Proceedings Volume 6996, Silicon Photonics and Photonic Integrated Circuits; 699612 (2008); doi: 10.1117/12.781700
Event: SPIE Photonics Europe, 2008, Strasbourg, France
Abstract
A new class of integrated optical waveguide structures ("TriPleX") is presented, based on low cost CMOS-compatible LPCVD processing of alternating Si3N4 and SiO2 layers. The technology allows for medium and high index-contrast waveguides that exhibit low channel attenuation. In addition, TriPleX waveguides are suitable for operation at wavelengths from visible (< 500 nm) through the infra-red range (2 μm and beyond). The geometry is basically formed by a rectangular cross-section of silicon nitride (Si3N4) filled with and encapsulated by silicon dioxide (SiO2). The birefringence and minimal bend radius of the waveguide are completely controlled by the geometry of the waveguide layer structures. Experiments on typical geometries show excellent characteristics for telecom wavelengths at ~1300 nm-1600 nm (channel attenuation ≤ 0.06 dB/cm, Insertion Loss (IL) ≤ 0.15 dB, Polarization Dependent Loss (PDL) ≤ 0.1 dB, Group Birefringence (Bg) << 1×10-4, bend radius ≤ 50-100 μm).
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Willem Hoving, Rene Heideman, Douwe Geuzebroek, Arne Leinse, Edwin Klein, Ronald Dekker, "Low loss, high contrast planar optical waveguides based on low-cost CMOS compatible LPCVD processing", Proc. SPIE 6996, Silicon Photonics and Photonic Integrated Circuits, 699612 (1 May 2008); doi: 10.1117/12.781700; https://doi.org/10.1117/12.781700
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KEYWORDS
Waveguides

Low pressure chemical vapor deposition

Silica

Birefringence

Photonics

Integrated optics

Signal attenuation

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