Resonance transition 795-nm rubidium laser using He buffer gas

Sheldon S. Q. Wu; Thomas F. Soules; Ralph H. Page; Scott C. Mitchell; V. Keith Kanz; Raymond J. Beach

doi:10.1117/12.782376

12 May 2008 Resonance transition 795-nm rubidium laser using He buffer gas

Sheldon S. Q. Wu, Thomas F. Soules, Ralph H. Page, Scott C. Mitchell, V. Keith Kanz, Raymond J. Beach

Proceedings Volume 7005, High-Power Laser Ablation VII; 700523 (2008) https://doi.org/10.1117/12.782376
Event: High-Power Laser Ablation 2008, 2008, Taos, New Mexico, United States

Abstract

Resonance transition rubidium laser (5²P_1/2→5²S_1/2) is demonstrated with a hydrocarbon-free buffer gas. Prior demonstrations of alkali resonance transition lasers have used ethane as either the buffer gas or a buffer gas component to promote rapid fine-structure mixing. However, our experience suggests that the alkali vapor reacts with the ethane producing carbon as one of the reaction products. This degrades long term laser reliability. Our recent experimental results with a "clean" helium-only buffer gas system pumped by a Ti:sapphire laser demonstrate all the advantages of the original alkali laser system, but without the reliability issues associated with the use of ethane. We further report a demonstration of a rubidium laser using a buffer gas consisting of pure ³He. Using isotopically enriched ³He gas yields enhanced mixing of the Rb fine-structure levels. This enables efficient lasing at reduced He buffer gas pressure, improved thermal management in high average power Rb lasers and enhanced power scaling potential of such systems.

Citation Download Citation

Sheldon S. Q. Wu, Thomas F. Soules, Ralph H. Page, Scott C. Mitchell, V. Keith Kanz, and Raymond J. Beach "Resonance transition 795-nm rubidium laser using He buffer gas", Proc. SPIE 7005, High-Power Laser Ablation VII, 700523 (12 May 2008); https://doi.org/10.1117/12.782376

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