Magnetic field for efficient exhaustion of CO2 laser-produced Sn plasma in EUV light source

Yoshifumi Ueno; Georg Soumagne; Takashi Suganuma; Takayuki Yabu; Masato Moriya; Hiroshi Komori; Tamotsu Abe; Akira Endo; Akira Sumitani

doi:10.1117/12.782475

12 May 2008 Magnetic field for efficient exhaustion of CO₂ laser-produced Sn plasma in EUV light source

Yoshifumi Ueno, Georg Soumagne, Takashi Suganuma, Takayuki Yabu, Masato Moriya, Hiroshi Komori, Tamotsu Abe, Akira Endo, Akira Sumitani

Author Affiliations +

Proceedings Volume 7005, High-Power Laser Ablation VII; 70052U (2008) https://doi.org/10.1117/12.782475
Event: High-Power Laser Ablation 2008, 2008, Taos, New Mexico, United States

Abstract

We are developing a laser produced plasma light source for high volume manufacturing (HVM) EUV lithography. The light source is based on a high power, high repetition rate CO₂ laser (10.6μm) system, a tin (Sn) target and a magnetic ion guiding for Sn treatment. We evaluated the characteristics of Sn debris generated by a CO₂ laser produced plasma. Experiments were performed with bulk Sn-plate targets and Mo/Si multilayer mirror samples were used for debris analysis. We observed very thin and uniform Sn layers of nano/sub-nano size debris particles. The layer deposition rate at 120mm from the plasma is, without magnetic field, about 30nm per million shots. The fast Sn ion flux was measured with Faraday cups and the signal decreased by more than 3 orders of magnitude on application of a magnetic field of 1T. The Sn deposition on the Mo/Si multilayer mirror decreased in small magnetic field space by a factor of 5. In a large magnetic field space, the effectiveness of the magnetic guiding of Sn ions is examined by monitoring the fast Sn ions. The ion flux from a Sn plasma was confined along the magnetic axis with a maximum magnetic field of 2T.

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Yoshifumi Ueno, Georg Soumagne, Takashi Suganuma, Takayuki Yabu, Masato Moriya, Hiroshi Komori, Tamotsu Abe, Akira Endo, and Akira Sumitani "Magnetic field for efficient exhaustion of CO₂ laser-produced Sn plasma in EUV light source", Proc. SPIE 7005, High-Power Laser Ablation VII, 70052U (12 May 2008); https://doi.org/10.1117/12.782475

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