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23 July 2008 A new factory for silicon grisms
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Abstract
We present the results of our project aimed to design and construct silicon grisms. The fabrication of such devices is a complex and critical process involving litho masking, anisotropic etching and direct bonding techniques. After the successful fabrication of the silicon grating, we have optimized the bonding of the grating onto the hypotenuse of a silicon prism to get the final prototype. After some critical phases during the experimentation a silicon grism has been eventually fabricated with 363.6 grooves/mm and 14 degrees of blaze angle. The results of the cryo-optical laboratory tests are reported, along with a general description of the adopted technological process. The positive results allows us to offer to the international community a new capability in building such devices.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
F. Vitali, V. Foglietti, E. Cianci, and D. Lorenzetti "A new factory for silicon grisms", Proc. SPIE 7018, Advanced Optical and Mechanical Technologies in Telescopes and Instrumentation, 70184P (23 July 2008); https://doi.org/10.1117/12.787525
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