29 April 2008 Manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities
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Proceedings Volume 7025, Micro- and Nanoelectronics 2007; 702505 (2008); doi: 10.1117/12.802351
Event: Micro- and Nanoelectronics 2007, 2007, Zvenigorod, Russian Federation
Abstract
Status of activities in field of manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities carrying out in IPM RAS is reported. Some physical aspects of operation of interferometers with diffraction reference wave are considered. A scheme of a point diffraction interferometer developed in IPM is presented. Last experimental data on making high precision spherical substrates with NA=0.25 are presented. A problem of surface shape measurements of aspherical substrates with a help of a point diffraction interferometer is discussed. A scheme of measurements and experimental data of wave deformation of 6-lens objective are given.
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Nikolay I. Chkhalo, Evgeniy B. Kluenkov, Aleksey E. Pestov, Denis G. Raskin, Nikolay N. Salashchenko, Mikhail N. Toropov, "Manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities", Proc. SPIE 7025, Micro- and Nanoelectronics 2007, 702505 (29 April 2008); doi: 10.1117/12.802351; https://doi.org/10.1117/12.802351
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KEYWORDS
Interferometers

Mirrors

Objectives

Spherical lenses

Diffraction

Lithography

Point diffraction interferometers

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