29 April 2008 Films with regulated optical and electrophysical parameters
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Proceedings Volume 7025, Micro- and Nanoelectronics 2007; 70250Z (2008) https://doi.org/10.1117/12.802426
Event: Micro- and Nanoelectronics 2007, 2007, Zvenigorod, Russian Federation
There are proposed methods of film heterostructures deposition by means of a magnetron and an ion source. They make it possible to regulate compositions of film structures and also other parameters, for example refractive indexes, conductivity. It is possible to form a film with preliminary demanded values of parameters in the wide range. Refractive index of films on the base of Ti was varied in the range of values 1.70 . n . 2.45. Conductivity of film structures changed from metal up to high resistance isolator. Diamond . like carbon , SixCy, SixOy, SixOyNz and other kinds of film structures were made by means of an ion source with a cold cathode directly from an ion beam. Refractive index value changed in the range of 1.40 . n . 2.65. It is modified a laser method of end point detection of transparent film deposition process after reaching of a demanded thickness. It has been modified a laser scanning system for wafers and semiconductor structures surfaces investigation. This system can measure parameters at 10000 points on square up to 100 x 100 mm2. It can be used for computer modelling, solar cells and silicon-oninsulator (SOI) structures investigations.
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A. E. Akinin, A. E. Akinin, I. S. Borisov, I. S. Borisov, V. V. Chernokogin, V. V. Chernokogin, Y. A. Kontsevoy, Y. A. Kontsevoy, E. A. Mitrofanov, E. A. Mitrofanov, S. B. Simakin, S. B. Simakin, Y. A. Zavadsky, Y. A. Zavadsky, "Films with regulated optical and electrophysical parameters", Proc. SPIE 7025, Micro- and Nanoelectronics 2007, 70250Z (29 April 2008); doi: 10.1117/12.802426; https://doi.org/10.1117/12.802426


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